Slot: purging_duration
Duration of the purge step between ALD pulses.
URI: VOC4CAT:0000112 Alias: purging_duration
Applicable Classes
| Name | Description | Modifies Slot |
|---|---|---|
| AtomicLayerDeposition | Catalyst preparation by atomic layer deposition (ALD): sequential self-limiting surface reactions deposit a conformal thin film of active phase onto a substrate. |
no |
Properties
-
Range: Float
-
Multivalued: True
Identifier and Mapping Information
Schema Source
- from schema: https://w3id.org/nfdi4cat/coremeta4cat
Mappings
| Mapping Type | Mapped Value |
|---|---|
| self | VOC4CAT:0000112 |
| native | coremeta4cat:purging_duration |
LinkML Source
name: purging_duration
description: Duration of the purge step between ALD pulses.
from_schema: https://w3id.org/nfdi4cat/coremeta4cat
rank: 1000
slot_uri: VOC4CAT:0000112
alias: purging_duration
domain_of:
- AtomicLayerDeposition
range: float
multivalued: true
unit:
ucum_code: s